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Ziegler M, Dathe A, Pollok K, et al. Metastable Atomic Layer Deposition: 3D Self-Assembly toward Ultradark Materials. ACS Nano. 2020;14(11):15023-15031doi: 10.1021/acsnano.0c04974.
Ziegler, M., Dathe, A., Pollok, K., Langenhorst, F., Hübner, U., Wang, D., & Schaaf, P. (2020). Metastable Atomic Layer Deposition: 3D Self-Assembly toward Ultradark Materials. ACS nano, 14(11), 15023-15031. https://doi.org/10.1021/acsnano.0c04974
Ziegler, Mario, et al. "Metastable Atomic Layer Deposition: 3D Self-Assembly toward Ultradark Materials." ACS nano vol. 14,11 (2020): 15023-15031. doi: https://doi.org/10.1021/acsnano.0c04974
Ziegler M, Dathe A, Pollok K, Langenhorst F, Hübner U, Wang D, Schaaf P. Metastable Atomic Layer Deposition: 3D Self-Assembly toward Ultradark Materials. ACS Nano. 2020 Nov 24;14(11):15023-15031. doi: 10.1021/acsnano.0c04974. Epub 2020 Oct 06. PMID: 33022175.
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ACS Nano. 2020 Nov 24;14(11):15023-15031. doi: 10.1021/acsnano.0c04974. Epub 2020 Oct 06.

Metastable Atomic Layer Deposition: 3D Self-Assembly toward Ultradark Materials.

ACS nano

Mario Ziegler, André Dathe, Kilian Pollok, Falko Langenhorst, Uwe Hübner, Dong Wang, Peter Schaaf

Affiliations

  1. Competence Center for Micro- and Nanotechnologies, Leibniz Institute of Photonic Technology Jena (IPHT), Albert-Einstein-Straße 9, 07745 Jena, Germany.
  2. Chair of Materials for Electrical Engineering and Electronics, Institute of Materials Science and Engineering and Institute of Micro- and Nanotechnologies MacroNano, TU Ilmenau, Gustav-Kirchhoff-Straße 5, 98693 Ilmenau, Germany.
  3. Single-Molecule Microscopy Group, Jena University Hospital, Friedrich Schiller University, 07745 Jena, Germany.
  4. Institute of Geosciences, Friedrich Schiller University Jena, Carl-Zeiss-Promenade 10, 07745 Jena, Germany.
  5. Hawaíi Institute of Geophysics and Planetology, School of Ocean and Earth Sciences and Technology, University of Hawaíi at Manoa, Honolulu, Hawaii 96822, United States.

PMID: 33022175 DOI: 10.1021/acsnano.0c04974

Abstract

Black body materials are promising candidates to meet future energy demands, as they are able to harvest energy from the total bandwidth of solar radiation. Here, we report on high-absorption near-blackbody-like structures (>98% for a wide solar spectrum range from 220 to 2500 nm) consisting of a silica scaffold and Ag nanoparticles with a layer thickness below 10 μm, fabricated using metastable atomic layer deposition (MS-ALD). Several effects contribute collectively and in a synergistic manner to the ultrahigh absorption, including the pronounced heterogeneity of the nanoparticles in size and shape, particle plasmon hybridization, and the trapping of omnidirectionally scattered light in the 3D hierarchical hybrid structures. We propose that, in the future, MS-ALD needs to be considered as a simple and promising method to fabricate blackbody materials with excellent broadband absorption.

Keywords: broad-band absorber; image-derived finite element method; metastable atomic layer deposition; self-assembly; ultradark material

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