Cite
Singer JP, Kooi SE, Thomas EL. Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning. Nanoscale. 2011;3(7):2730-8doi: 10.1039/c1nr10050e.
Singer, J. P., Kooi, S. E., & Thomas, E. L. (2011). Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning. Nanoscale, 3(7), 2730-8. https://doi.org/10.1039/c1nr10050e
Singer, Jonathan P, et al. "Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning." Nanoscale vol. 3,7 (2011): 2730-8. doi: https://doi.org/10.1039/c1nr10050e
Singer JP, Kooi SE, Thomas EL. Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning. Nanoscale. 2011 Jul;3(7):2730-8. doi: 10.1039/c1nr10050e. Epub 2011 Apr 18. PMID: 21503354.
Copy
Download .nbib