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Jang, M. H., & Lei, Y. (2020). Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 38(6), 062405.
Jang, Moon-Hyung, and Yu Lei. "Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 38.6 (2020): 062405.
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MH Jang, Y Lei - Journal of Vacuum Science & Technology A …, 2020 - avs.scitation.org

Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition.

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Jang, Lei

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Excerpt

Room temperature evaporation of titanium isopropoxide [Ti [OCH (CH3) 2] 4, TTIP] precursor was performed using ultrasonic atomization for TiO2 atomic layer deposition (ALD). Quartz crystal microbalance data show comparable results between room temperature TTIP ultrasonic atomization and conventional thermal evaporation. The TiO2 ALD saturation window is established for room temperature atomized TTIP exposure time and reactor temperatures. Room temperature atomized TTIP grown TiO2 films show smooth surface …

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