Cite
Hage FS, Hardcastle TP, Gjerding MN, et al. Local Plasmon Engineering in Doped Graphene. ACS Nano. 2018;12(2):1837-1848doi: 10.1021/acsnano.7b08650.
Hage, F. S., Hardcastle, T. P., Gjerding, M. N., Kepaptsoglou, D. M., Seabourne, C. R., Winther, K. T., Zan, R., Amani, J. A., Hofsaess, H. C., Bangert, U., Thygesen, K. S., & Ramasse, Q. M. (2018). Local Plasmon Engineering in Doped Graphene. ACS nano, 12(2), 1837-1848. https://doi.org/10.1021/acsnano.7b08650
Hage, Fredrik Sydow, et al. "Local Plasmon Engineering in Doped Graphene." ACS nano vol. 12,2 (2018): 1837-1848. doi: https://doi.org/10.1021/acsnano.7b08650
Hage FS, Hardcastle TP, Gjerding MN, Kepaptsoglou DM, Seabourne CR, Winther KT, Zan R, Amani JA, Hofsaess HC, Bangert U, Thygesen KS, Ramasse QM. Local Plasmon Engineering in Doped Graphene. ACS Nano. 2018 Feb 27;12(2):1837-1848. doi: 10.1021/acsnano.7b08650. Epub 2018 Feb 02. PMID: 29369611.
Copy
Download .nbib