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Rawlings C, Ryu YK, Rüegg M, et al. Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing. Nanotechnology. 2018;29(50):505302doi: 10.1088/1361-6528/aae3df.
Rawlings, C., Ryu, Y. K., Rüegg, M., Lassaline, N., Schwemmer, C., Duerig, U., Knoll, A. W., Durrani, Z., Wang, C., Liu, D., & Jones, M. E. (2018). Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing. Nanotechnology, 29(50), 505302. https://doi.org/10.1088/1361-6528/aae3df
Rawlings, Colin, et al. "Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing." Nanotechnology vol. 29,50 (2018): 505302. doi: https://doi.org/10.1088/1361-6528/aae3df
Rawlings C, Ryu YK, Rüegg M, Lassaline N, Schwemmer C, Duerig U, Knoll AW, Durrani Z, Wang C, Liu D, Jones ME. Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing. Nanotechnology. 2018 Dec 14;29(50):505302. doi: 10.1088/1361-6528/aae3df. Epub 2018 Sep 24. PMID: 30248025.
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