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Ionescu R, George A, Ruiz I, et al. Oxygen etching of thick MoS2 films. Chem Commun (Camb). 2014;50(76):11226-9doi: 10.1039/c4cc03911d.
Ionescu, R., George, A., Ruiz, I., Favors, Z., Mutlu, Z., Liu, C., Ahmed, K., Wu, R., Jeong, J. S., Zavala, L., Mkhoyan, K. A., Ozkan, M., & Ozkan, C. S. (2014). Oxygen etching of thick MoS2 films. Chemical communications (Cambridge, England), 50(76), 11226-9. https://doi.org/10.1039/c4cc03911d
Ionescu, Robert, et al. "Oxygen etching of thick MoS2 films." Chemical communications (Cambridge, England) vol. 50,76 (2014): 11226-9. doi: https://doi.org/10.1039/c4cc03911d
Ionescu R, George A, Ruiz I, Favors Z, Mutlu Z, Liu C, Ahmed K, Wu R, Jeong JS, Zavala L, Mkhoyan KA, Ozkan M, Ozkan CS. Oxygen etching of thick MoS2 films. Chem Commun (Camb). 2014 Oct 04;50(76):11226-9. doi: 10.1039/c4cc03911d. PMID: 25116379.
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