Cite
Kuświk P, Sveklo I, Szymański B, et al. Colloidal domain lithography in multilayers with perpendicular anisotropy: an experimental study and micromagnetic simulations. Nanotechnology. 2012;23(47):475303doi: 10.1088/0957-4484/23/47/475303.
Kuświk, P., Sveklo, I., Szymański, B., Urbaniak, M., Stobiecki, F., Ehresmann, A., Engel, D., Mazalski, P., Maziewski, A., & Jagielski, J. (2012). Colloidal domain lithography in multilayers with perpendicular anisotropy: an experimental study and micromagnetic simulations. Nanotechnology, 23(47), 475303. https://doi.org/10.1088/0957-4484/23/47/475303
Kuświk, Piotr, et al. "Colloidal domain lithography in multilayers with perpendicular anisotropy: an experimental study and micromagnetic simulations." Nanotechnology vol. 23,47 (2012): 475303. doi: https://doi.org/10.1088/0957-4484/23/47/475303
Kuświk P, Sveklo I, Szymański B, Urbaniak M, Stobiecki F, Ehresmann A, Engel D, Mazalski P, Maziewski A, Jagielski J. Colloidal domain lithography in multilayers with perpendicular anisotropy: an experimental study and micromagnetic simulations. Nanotechnology. 2012 Nov 30;23(47):475303. doi: 10.1088/0957-4484/23/47/475303. Epub 2012 Nov 01. PMID: 23117890.
Copy
Download .nbib