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Holland M, van Dal M, Duriez B, et al. Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration. Sci Rep. 2017;7(1):14632doi: 10.1038/s41598-017-15025-0.
Holland, M., van Dal, M., Duriez, B., Oxland, R., Vellianitis, G., Doornbos, G., Afzalian, A., Chen, T. K., Hsieh, C. H., Ramvall, P., Vasen, T., Yeo, Y. C., & Passlack, M. (2017). Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration. Scientific reports, 7(1), 14632. https://doi.org/10.1038/s41598-017-15025-0
Holland, Martin, et al. "Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration." Scientific reports vol. 7,1 (2017): 14632. doi: https://doi.org/10.1038/s41598-017-15025-0
Holland M, van Dal M, Duriez B, Oxland R, Vellianitis G, Doornbos G, Afzalian A, Chen TK, Hsieh CH, Ramvall P, Vasen T, Yeo YC, Passlack M. Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration. Sci Rep. 2017 Nov 07;7(1):14632. doi: 10.1038/s41598-017-15025-0. PMID: 29116157; PMCID: PMC5676749.
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