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Decosterd L, Topka KC, Diallo B, et al. An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine. Phys Chem Chem Phys. 2021;23(17):10560-10572doi: 10.1039/d1cp01129d.
Decosterd, L., Topka, K. C., Diallo, B., Samelor, D., Vergnes, H., Senocq, F., Caussat, B., Vahlas, C., & Menu, M. J. (2021). An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine. Physical chemistry chemical physics : PCCP, 23(17), 10560-10572. https://doi.org/10.1039/d1cp01129d
Decosterd, Laura, et al. "An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine." Physical chemistry chemical physics : PCCP vol. 23,17 (2021): 10560-10572. doi: https://doi.org/10.1039/d1cp01129d
Decosterd L, Topka KC, Diallo B, Samelor D, Vergnes H, Senocq F, Caussat B, Vahlas C, Menu MJ. An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine. Phys Chem Chem Phys. 2021 May 05;23(17):10560-10572. doi: 10.1039/d1cp01129d. PMID: 33903868.
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