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Xu X, Vereecke G, Chen C, et al. Capturing wetting states in nanopatterned silicon. ACS Nano. 2014;8(1):885-93doi: 10.1021/nn405621w.
Xu, X., Vereecke, G., Chen, C., Pourtois, G., Armini, S., Verellen, N., Tsai, W. K., Kim, D. W., Lee, E., Lin, C. Y., Van Dorpe, P., Struyf, H., Holsteyns, F., Moshchalkov, V., Indekeu, J., & De Gendt, S. (2014). Capturing wetting states in nanopatterned silicon. ACS nano, 8(1), 885-93. https://doi.org/10.1021/nn405621w
Xu, Xiumei, et al. "Capturing wetting states in nanopatterned silicon." ACS nano vol. 8,1 (2014): 885-93. doi: https://doi.org/10.1021/nn405621w
Xu X, Vereecke G, Chen C, Pourtois G, Armini S, Verellen N, Tsai WK, Kim DW, Lee E, Lin CY, Van Dorpe P, Struyf H, Holsteyns F, Moshchalkov V, Indekeu J, De Gendt S. Capturing wetting states in nanopatterned silicon. ACS Nano. 2014 Jan 28;8(1):885-93. doi: 10.1021/nn405621w. Epub 2014 Jan 13. PMID: 24380402.
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