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Van Erps J, Ciuk T, Pasternak I, et al. Laser ablation- and plasma etching-based patterning of graphene on silicon-on-insulator waveguides. Opt Express. 2015;23(20):26639-50doi: 10.1364/OE.23.026639.
Van Erps, J., Ciuk, T., Pasternak, I., Krajewska, A., Strupinski, W., Van Put, S., Van Steenberge, G., Baert, K., Terryn, H., Thienpont, H., & Vermeulen, N. (2015). Laser ablation- and plasma etching-based patterning of graphene on silicon-on-insulator waveguides. Optics express, 23(20), 26639-50. https://doi.org/10.1364/OE.23.026639
Van Erps, Jürgen, et al. "Laser ablation- and plasma etching-based patterning of graphene on silicon-on-insulator waveguides." Optics express vol. 23,20 (2015): 26639-50. doi: https://doi.org/10.1364/OE.23.026639
Van Erps J, Ciuk T, Pasternak I, Krajewska A, Strupinski W, Van Put S, Van Steenberge G, Baert K, Terryn H, Thienpont H, Vermeulen N. Laser ablation- and plasma etching-based patterning of graphene on silicon-on-insulator waveguides. Opt Express. 2015 Oct 05;23(20):26639-50. doi: 10.1364/OE.23.026639. PMID: 26480176.
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