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Grogan DF, Zhao T, Bovard BG, et al. Planarizing technique for ion-beam polishing of diamond films. Appl Opt. 1992;31(10):1483-7doi: 10.1364/AO.31.001483.
Grogan, D. F., Zhao, T., Bovard, B. G., & Macleod, H. A. (1992). Planarizing technique for ion-beam polishing of diamond films. Applied optics, 31(10), 1483-7. https://doi.org/10.1364/AO.31.001483
Grogan, D F, et al. "Planarizing technique for ion-beam polishing of diamond films." Applied optics vol. 31,10 (1992): 1483-7. doi: https://doi.org/10.1364/AO.31.001483
Grogan DF, Zhao T, Bovard BG, Macleod HA. Planarizing technique for ion-beam polishing of diamond films. Appl Opt. 1992 Apr 01;31(10):1483-7. doi: 10.1364/AO.31.001483. PMID: 20720781.
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Appl Opt. 1992 Apr 01;31(10):1483-7. doi: 10.1364/AO.31.001483.

Planarizing technique for ion-beam polishing of diamond films.

Applied optics

D F Grogan, T Zhao, B G Bovard, H A Macleod

PMID: 20720781 DOI: 10.1364/AO.31.001483

Abstract

Diamond films, deposited on silicon substrates through microwave-assisted chemical vapor deposition, have been polished with a 500-eV beam of oxygen ions through the use of a planarizing layer. The films' surface roughness, in excess of 1 microm (rms) and 6 microm (peak to valley), was reduced to 35 nm (rms) and 217 nm (peak to valley). The polished films retained their diamond character and surface contamination was negligible. With this polishing process, optical applications of diamond films in the near infrared region are realizable.

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