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Shirato N, Cummings M, Kersell H, et al. Elemental fingerprinting of materials with sensitivity at the atomic limit. Nano Lett. 2014;14(11):6499-504doi: 10.1021/nl5030613.
Shirato, N., Cummings, M., Kersell, H., Li, Y., Stripe, B., Rosenmann, D., Hla, S. W., & Rose, V. (2014). Elemental fingerprinting of materials with sensitivity at the atomic limit. Nano letters, 14(11), 6499-504. https://doi.org/10.1021/nl5030613
Shirato, Nozomi, et al. "Elemental fingerprinting of materials with sensitivity at the atomic limit." Nano letters vol. 14,11 (2014): 6499-504. doi: https://doi.org/10.1021/nl5030613
Shirato N, Cummings M, Kersell H, Li Y, Stripe B, Rosenmann D, Hla SW, Rose V. Elemental fingerprinting of materials with sensitivity at the atomic limit. Nano Lett. 2014 Nov 12;14(11):6499-504. doi: 10.1021/nl5030613. Epub 2014 Oct 06. PMID: 25275823.
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Nano Lett. 2014 Nov 12;14(11):6499-504. doi: 10.1021/nl5030613. Epub 2014 Oct 06.

Elemental fingerprinting of materials with sensitivity at the atomic limit.

Nano letters

Nozomi Shirato, Marvin Cummings, Heath Kersell, Yang Li, Benjamin Stripe, Daniel Rosenmann, Saw-Wai Hla, Volker Rose

Affiliations

  1. Advanced Photon Source, Argonne National Laboratory , 9700 South Cass Ave, Argonne, Illinois 60439, United States.

PMID: 25275823 DOI: 10.1021/nl5030613

Abstract

By using synchrotron X-rays as a probe and a nanofabricated smart tip of a tunneling microscope as a detector, we have achieved chemical fingerprinting of individual nickel clusters on a Cu(111) surface at 2 nm lateral resolution, and at the ultimate single-atomic height sensitivity. Moreover, by varying the photon energy, we have succeeded to locally measure photoionization cross sections of just a single Ni nanocluster, which opens new exciting opportunities for chemical imaging of nanoscale materials.

Keywords: X-ray microscopy; chemical imaging; scanning tunneling microscopy; smart tips; synchrotron

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