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DelRio FW, White RM, Krylyuk S, et al. Near-theoretical fracture strengths in native and oxidized silicon nanowires. Nanotechnology. 2016;27(31):31LT02doi: 10.1088/0957-4484/27/31/31LT02.
DelRio, F. W., White, R. M., Krylyuk, S., Davydov, A. V., Friedman, L. H., & Cook, R. F. (2016). Near-theoretical fracture strengths in native and oxidized silicon nanowires. Nanotechnology, 27(31), 31LT02. https://doi.org/10.1088/0957-4484/27/31/31LT02
DelRio, Frank W, et al. "Near-theoretical fracture strengths in native and oxidized silicon nanowires." Nanotechnology vol. 27,31 (2016): 31LT02. doi: https://doi.org/10.1088/0957-4484/27/31/31LT02
DelRio FW, White RM, Krylyuk S, Davydov AV, Friedman LH, Cook RF. Near-theoretical fracture strengths in native and oxidized silicon nanowires. Nanotechnology. 2016 Aug 05;27(31):31LT02. doi: 10.1088/0957-4484/27/31/31LT02. Epub 2016 Jun 21. PMID: 27325151.
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Nanotechnology. 2016 Aug 05;27(31):31LT02. doi: 10.1088/0957-4484/27/31/31LT02. Epub 2016 Jun 21.

Near-theoretical fracture strengths in native and oxidized silicon nanowires.

Nanotechnology

Frank W DelRio, Ryan M White, Sergiy Krylyuk, Albert V Davydov, Lawrence H Friedman, Robert F Cook

Affiliations

  1. Material Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO 80305, USA.

PMID: 27325151 DOI: 10.1088/0957-4484/27/31/31LT02

Abstract

In this letter, fracture strengths σ f of native and oxidized silicon nanowires (SiNWs) were determined via atomic force microscopy bending experiments and nonlinear finite element analysis. In the native SiNWs, σ f in the Si was comparable to the theoretical strength of Si〈111〉, ≈22 GPa. In the oxidized SiNWs, σ f in the SiO2 was comparable to the theoretical strength of SiO2, ≈6 to 12 GPa. The results indicate a change in the failure mechanism between native SiNWs, in which fracture originated via inter-atomic bond breaking or atomic-scale defects in the Si, and oxidized SiNWs, in which fracture initiated from surface roughness or nano-scale defects in the SiO2.

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