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Nanoscale Res Lett. 2017 Dec;12(1):276. doi: 10.1186/s11671-017-2048-2. Epub 2017 Apr 17.

Engineering the Complex-Valued Constitutive Parameters of Metamaterials for Perfect Absorption.

Nanoscale research letters

Pengwei Wang, Naibo Chen, Chaojun Tang, Jing Chen, Fanxin Liu, Saiqian Sheng, Bo Yan, Chenghua Sui

Affiliations

  1. Center for Optics & Optoelectronics Research, Department of Applied Physics, Zhejiang University of Technology, Hangzhou, 310023, China.
  2. Center for Optics & Optoelectronics Research, Department of Applied Physics, Zhejiang University of Technology, Hangzhou, 310023, China. [email protected].
  3. College of Electronic Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing, 210023, China. [email protected].
  4. National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, China. [email protected].
  5. National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, China.

PMID: 28420225 PMCID: PMC5394092 DOI: 10.1186/s11671-017-2048-2

Abstract

We theoretically studied how to directly engineer the constitutive parameters of metamaterials for perfect absorbers of electromagnetic waves. As an example, we numerically investigated the necessary refractive index n and extinction coefficient k and the relative permittivity ε and permeability μ of a metamaterial anti-reflection layer, which could cancel the reflection from a hydrogenated amorphous silicon (α-Si:H) thin film on a metal substrate, within the visible wavelength range from 300 to 800 nm. We found that the metamaterial anti-reflection layer should have a negative refractive index (n < 0) for short-wavelength visible light but have a positive refractive index (n > 0) for long-wavelength visible light. The relative permittivity ε and permeability μ could be fitted by the Lorentz model, which exhibited electric and magnetic resonances, respectively.

Keywords: Anti-reflection coating; Light harvesting; Metamaterials; Perfect absorbers

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