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Peterson GW, Destefano MR, Garibay SJ, et al. Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH. Chemistry. 2017;23(63):15913-15916doi: 10.1002/chem.201704525.
Peterson, G. W., Destefano, M. R., Garibay, S. J., Ploskonka, A., McEntee, M., Hall, M., Karwacki, C. J., Hupp, J. T., & Farha, O. K. (2017). Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH. Chemistry (Weinheim an der Bergstrasse, Germany), 23(63), 15913-15916. https://doi.org/10.1002/chem.201704525
Peterson, Gregory W, et al. "Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH." Chemistry (Weinheim an der Bergstrasse, Germany) vol. 23,63 (2017): 15913-15916. doi: https://doi.org/10.1002/chem.201704525
Peterson GW, Destefano MR, Garibay SJ, Ploskonka A, McEntee M, Hall M, Karwacki CJ, Hupp JT, Farha OK. Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH. Chemistry. 2017 Nov 13;23(63):15913-15916. doi: 10.1002/chem.201704525. Epub 2017 Oct 24. PMID: 28949042.
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Chemistry. 2017 Nov 13;23(63):15913-15916. doi: 10.1002/chem.201704525. Epub 2017 Oct 24.

Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH.

Chemistry (Weinheim an der Bergstrasse, Germany)

Gregory W Peterson, Matthew R Destefano, Sergio J Garibay, Ann Ploskonka, Monica McEntee, Morgan Hall, Christopher J Karwacki, Joseph T Hupp, Omar K Farha

Affiliations

  1. Edgewood Chemical Biological Center, 5183 Blackhawk Rd., Aberdeen Proving Ground, MD, 21010, USA.
  2. Department of Chemistry and the International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
  3. Leidos, Inc., PO Box 68, Gunpowder, MD, 21010, USA.

PMID: 28949042 DOI: 10.1002/chem.201704525

Abstract

For the first time, an increasing number of defects were introduced to the metal-organic framework UiO-66-NH

© 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords: adsorption; chemical warfare agents; defects; metal-organic frameworks; toxic chemicals

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