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Zou Z, Hu YF, Sham TK, et al. XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge. J Synchrotron Radiat. 1999;6:524-5doi: 10.1107/S0909049599001247.
Zou, Z., Hu, Y. F., Sham, T. K., Huang, H. H., Xu, G. Q., Seet, C. S., & Chan, L. (1999). XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge. Journal of synchrotron radiation, 6524-5. https://doi.org/10.1107/S0909049599001247
Zou, Z, et al. "XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge." Journal of synchrotron radiation vol. 6 (1999): 524-5. doi: https://doi.org/10.1107/S0909049599001247
Zou Z, Hu YF, Sham TK, Huang HH, Xu GQ, Seet CS, Chan L. XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge. J Synchrotron Radiat. 1999 May 01;6:524-5. doi: 10.1107/S0909049599001247. Epub 1999 May 01. PMID: 15263367.
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