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Caldwell JD, Glembocki OJ, Francescato Y, et al. Low-loss, extreme subdiffraction photon confinement via silicon carbide localized surface phonon polariton resonators. Nano Lett. 2013;13(8):3690-7doi: 10.1021/nl401590g.
Caldwell, J. D., Glembocki, O. J., Francescato, Y., Sharac, N., Giannini, V., Bezares, F. J., Long, J. P., Owrutsky, J. C., Vurgaftman, I., Tischler, J. G., Wheeler, V. D., Bassim, N. D., Shirey, L. M., Kasica, R., & Maier, S. A. (2013). Low-loss, extreme subdiffraction photon confinement via silicon carbide localized surface phonon polariton resonators. Nano letters, 13(8), 3690-7. https://doi.org/10.1021/nl401590g
Caldwell, Joshua D, et al. "Low-loss, extreme subdiffraction photon confinement via silicon carbide localized surface phonon polariton resonators." Nano letters vol. 13,8 (2013): 3690-7. doi: https://doi.org/10.1021/nl401590g
Caldwell JD, Glembocki OJ, Francescato Y, Sharac N, Giannini V, Bezares FJ, Long JP, Owrutsky JC, Vurgaftman I, Tischler JG, Wheeler VD, Bassim ND, Shirey LM, Kasica R, Maier SA. Low-loss, extreme subdiffraction photon confinement via silicon carbide localized surface phonon polariton resonators. Nano Lett. 2013 Aug 14;13(8):3690-7. doi: 10.1021/nl401590g. Epub 2013 Jul 10. PMID: 23815389.
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