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Kim WH, Minaye Hashemi FS, Mackus AJ, et al. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation. ACS Nano. 2016;10(4):4451-8doi: 10.1021/acsnano.6b00094.
Kim, W. H., Minaye Hashemi, F. S., Mackus, A. J., Singh, J., Kim, Y., Bobb-Semple, D., Fan, Y., Kaufman-Osborn, T., Godet, L., & Bent, S. F. (2016). A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation. ACS nano, 10(4), 4451-8. https://doi.org/10.1021/acsnano.6b00094
Kim, Woo-Hee, et al. "A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation." ACS nano vol. 10,4 (2016): 4451-8. doi: https://doi.org/10.1021/acsnano.6b00094
Kim WH, Minaye Hashemi FS, Mackus AJ, Singh J, Kim Y, Bobb-Semple D, Fan Y, Kaufman-Osborn T, Godet L, Bent SF. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation. ACS Nano. 2016 Apr 26;10(4):4451-8. doi: 10.1021/acsnano.6b00094. Epub 2016 Mar 15. PMID: 26950397.
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