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Jung JH, Lee SJ, Lee HJ, et al. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. J Nanosci Nanotechnol. 2015;15(11):8472-7doi: 10.1166/jnn.2015.11452.
Jung, J. H., Lee, S. J., Lee, H. J., Lee, M. Y., Cheon, T., Bae, S. I., Saito, M., Suzuki, K., Nabeya, S., Lee, J., Kim, S., Yeom, S., Seo, J. H., & Kim, S. H. (2015). Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. Journal of nanoscience and nanotechnology, 15(11), 8472-7. https://doi.org/10.1166/jnn.2015.11452
Jung, Jae-Hun, et al. "Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant." Journal of nanoscience and nanotechnology vol. 15,11 (2015): 8472-7. doi: https://doi.org/10.1166/jnn.2015.11452
Jung JH, Lee SJ, Lee HJ, Lee MY, Cheon T, Bae SI, Saito M, Suzuki K, Nabeya S, Lee J, Kim S, Yeom S, Seo JH, Kim SH. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. J Nanosci Nanotechnol. 2015 Nov;15(11):8472-7. doi: 10.1166/jnn.2015.11452. PMID: 26726537.
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